Electron-beam-resist materials with enhanced dry etch...

Polymer 1989 Vol. 30; Iss. 6

Electron-beam-resist materials with enhanced dry etch resistance

Stanley Affrossman, Hassan Angadji, Masood Bakhshaee, Kathleen Coffey, Fong Lung Chow, David Hayward, Gordon G. McLeod, Richard A. Pethrick, Paul Whittaker
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Volume:
30
Year:
1989
Language:
english
Pages:
5
DOI:
10.1016/0032-3861(89)90073-6
File:
PDF, 529 KB
english, 1989
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