![](/img/cover-not-exists.png)
Vapour deposition of poly(alkyl-2-cyanoacrylate) resist coatings: a new electron-beam/deep-ultra-violet photoresist technology
J. Woods, J. Guthrie, J. Rooney, L. Kelly, A. Doyle, E. NoonanVolume:
30
Year:
1989
Language:
english
Pages:
8
DOI:
10.1016/0032-3861(89)90086-4
File:
PDF, 752 KB
english, 1989