Physical properties of an oxide photoresist film for...

Thin Solid Films 2013 / 09 Vol. 542

Physical properties of an oxide photoresist film for submicron pattern lithography

Chiang, Donyau, Chang, Chun-Ming, Chen, Shi-Wei, Yang, Chin-Tien, Hsueh, Wen-Jeng
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Volume:
542
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2013.05.134
Date:
September, 2013
File:
PDF, 941 KB
english, 2013
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