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Effects of deposition gas pressure on the properties of hydrogenated amorphous carbon nitride films grown by surface wave microwave plasma chemical vapor deposition
Rusop, M., Omer, A.M.M., Adhikari, S., Adhikary, S., Uchida, H., Soga, T., Jimbo, T., Umeno, M.Volume:
14
Language:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/j.diamond.2004.12.040
Date:
March, 2005
File:
PDF, 216 KB
english, 2005