Mask roughness impact on extreme UV and 193nm immersion...

Microelectronic Engineering 2012 / 10 Vol. 98

Mask roughness impact on extreme UV and 193nm immersion lithography

Garidis, Konstantinos, Pret, Alessandro Vaglio, Gronheid, Roel
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Volume:
98
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2012.07.068
Date:
October, 2012
File:
PDF, 683 KB
english, 2012
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