Atomic resolution top-down nanofabrication with low-current...

Microelectronic Engineering 2012 / 10 Vol. 98

Atomic resolution top-down nanofabrication with low-current focused-ion-beam thinning

Li, Wuxia, Cui, Ajuan, Gu, Changzhi, Warburton, P.A.
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Volume:
98
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2012.07.108
Date:
October, 2012
File:
PDF, 308 KB
english, 2012
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