Effect of the degree of high power impulse magnetron...

Thin Solid Films 2014 / 07 Vol. 562

Effect of the degree of high power impulse magnetron sputtering utilisation on the structure and properties of TiN films

Hovsepian, Papken Eh., Sugumaran, Arunprabhu A., Purandare, Yashodhan, Loch, Daniel A.L., Ehiasarian, Arutiun P.
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Volume:
562
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2014.04.002
Date:
July, 2014
File:
PDF, 987 KB
english, 2014
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