In situ monitoring of GaN substrate surface in ICP...

Applied Surface Science 2014 / 02 Vol. 292

In situ monitoring of GaN substrate surface in ICP containing energetic electrons

Huang, Xiaojiang, Guo, Ying, Zhang, Jing, Nakano, Yoshitaka, Sugai, Hideo, Nakamura, Keiji
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Volume:
292
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2013.11.149
Date:
February, 2014
File:
PDF, 579 KB
english, 2014
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