Fabrication of hollow SiO2 nanoneedle array and...

Microelectronic Engineering 2012 / 10 Vol. 98

Fabrication of hollow SiO2 nanoneedle array and characterization of simultaneous multi-site ion-conductance recordings for cell morphology imaging

Kawashima, Takahiro, Matsugase, Tomoya, Tanaka, Kazumasa, Nagai, Moeto, Shibata, Takayuki, Mineta, Takashi, Makino, Eiji
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Volume:
98
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2012.07.014
Date:
October, 2012
File:
PDF, 1.02 MB
english, 2012
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