Plasma chemistry during deposition of a-C:H
Benedikt, J., Letourneur, K.G.Y., Wisse, M., Schram, D.C., van de Sanden, M.C.M.Volume:
11
Language:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/S0925-9635(01)00534-9
Date:
March, 2002
File:
PDF, 245 KB
english, 2002