Etch characteristics of MgO thin films in Cl2/Ar, CH3OH/Ar...

Vacuum 2014 / 03 Vol. 101

Etch characteristics of MgO thin films in Cl2/Ar, CH3OH/Ar and CH4/Ar plasmas

Lee, Il Hoon, Lee, Tea Young, Hwang, Su Min, Chung, Chee Won
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Volume:
101
Language:
english
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2013.10.012
Date:
March, 2014
File:
PDF, 865 KB
english, 2014
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