OES study of the plasma during CVD diamond growth using...

Diamond and Related Materials 2000 / 4 Vol. 9; Iss. 3-6

OES study of the plasma during CVD diamond growth using CCl4/H2/O2 mixtures

Ferreira, N.G., Corat, E.J., Trava-Airoldi, V.J., Leite, N.F.
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Volume:
9
Language:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/S0925-9635(99)00337-4
Date:
April, 2000
File:
PDF, 323 KB
english, 2000
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