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The deposition of aluminum nitride on silicon by plasma-enhanced metal-organic chemical vapour deposition
Stauden, Th., Eichhorn, G., Cimalla, V., Pezoldt, J., Ecke, G.Volume:
5
Language:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/0925-9635(96)00512-2
Date:
August, 1996
File:
PDF, 305 KB
english, 1996