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Deposition of microcrystalline intrinsic silicon by the Electrical Asymmetry Effect technique
Hrunski, D., Mootz, F., Zeuner, A., Janssen, A., Rost, H., Beckmann, R., Binder, S., Schüngel, E., Mohr, S., Luggenhölscher, D., Czarnetzki, U., Grabosch, G.Volume:
87
Language:
english
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2012.02.020
Date:
January, 2013
File:
PDF, 436 KB
english, 2013