Influence of Ar/H2 ratio on the characteristics of boron-doped nc-Si:H films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition
Zhang, Xueyu, Wu, Aimin, Shi, Shaofei, Qin, FuwenVolume:
228
Language:
english
Journal:
Surface and Coatings Technology
DOI:
10.1016/j.surfcoat.2012.05.056
Date:
August, 2013
File:
PDF, 522 KB
english, 2013