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Plasma characterization of a high-pressure d(-Sputtering system used for the “in situ” preparation of high-Tc superconducting thin films
D. Giratá, Y. Rojas, E. Bacca, M. Chacón, W. Lopera, P. Prieto, J. HeirasVolume:
90
Year:
1994
Language:
english
Pages:
4
DOI:
10.1016/0038-1098(94)90116-3
File:
PDF, 372 KB
english, 1994