Monolayer colloidal mask with tunable interstice size for...

Thin Solid Films 2013 / 10 Vol. 544

Monolayer colloidal mask with tunable interstice size for nanosphere lithography

Geng, Chong, Zheng, Lu, Yu, Jie, Yan, Qingfeng, Wang, Xiaoqing, Shen, Guangqiu, Shen, Dezhong
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Volume:
544
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2013.04.120
Date:
October, 2013
File:
PDF, 908 KB
english, 2013
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