Ellipsometry measurements on SiO2 films for thicknesses...

Solid-State Electronics 1987 Vol. 30; Iss. 9

Ellipsometry measurements on SiO2 films for thicknesses under 200Å

Jau Hwang Ho, Chung Len Lee, Chein Wei Jen, Tan Fu Lei
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Volume:
30
Year:
1987
Language:
english
Pages:
9
DOI:
10.1016/0038-1101(87)90134-1
File:
PDF, 716 KB
english, 1987
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