A study of electromigration in aluminum and aluminum-silicon thin film resistors using noise technique
A. Diligenti, P.E. Bagnoli, B. Neri, S. Bea, L. MantellassiVolume:
32
Year:
1989
Language:
english
Pages:
6
DOI:
10.1016/0038-1101(89)90042-7
File:
PDF, 597 KB
english, 1989