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Contact resistivities of Al and Ti on Si measured by a self-aligned vertical Kelvin test resistor structure
Wen Luh Yang, Tan Fu Lei, Chung Len LeeVolume:
32
Year:
1989
Language:
english
Pages:
5
DOI:
10.1016/0038-1101(89)90162-7
File:
PDF, 440 KB
english, 1989