Depth profiles of the Fermi level at an amorphous-carbon nitride/SiO2/n-type-Si heterojunction interface obtained by Kelvin probe force microscopy
Ishizaki, Takahiro, Saito, Nagahiro, Ohta, Riichiro, Takai, OsamuVolume:
15
Language:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/j.diamond.2005.10.001
Date:
September, 2006
File:
PDF, 131 KB
english, 2006