Characteristics of polycrystalline films grown by ultrahigh...

Solid-State Electronics 1995 Vol. 38; Iss. 12

Characteristics of polycrystalline films grown by ultrahigh vacuum chemical vapor deposition system

Hsiao-Yi Lin, Tan Fu Lei, Horng-Chih Lin, Chun-Yen Chang, Ruey-Ching Twu, Ray-Chern Deng, Jandel Lin
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Volume:
38
Year:
1995
Language:
english
Pages:
5
DOI:
10.1016/0038-1101(95)00030-w
File:
PDF, 351 KB
english, 1995
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