F2, H2O, and O2 etching rates of diamond and the effects of...

Diamond and Related Materials 1995 / 11 Vol. 4; Iss. 12

F2, H2O, and O2 etching rates of diamond and the effects of F2, HF and H2O on the molecular O2 etching of (110) diamond

Chu, C.J., Pan, C., Margrave, J.L., Hauge, R.H.
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Volume:
4
Language:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/0925-9635(95)00311-8
Date:
November, 1995
File:
PDF, 928 KB
english, 1995
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