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Reactive magnetron sputtering deposition and characterization of niobium carbide films
Zhang, Kan, Wen, M., Cheng, G., Li, X., Meng, Q.N., Lian, J.S., Zheng, W.T.Volume:
99
Language:
english
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2013.06.012
Date:
January, 2014
File:
PDF, 2.73 MB
english, 2014