Chemical vapor deposition of ruthenium–phosphorus alloy...

Thin Solid Films 2014 / 05 Vol. 558

Chemical vapor deposition of ruthenium–phosphorus alloy thin films: Using phosphine as the phosphorus source

Bost, Daniel E., Ekerdt, John G.
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Volume:
558
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2014.03.018
Date:
May, 2014
File:
PDF, 497 KB
english, 2014
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