Negative hybrid sol–gel resist as hard etching mask for...

Microelectronic Engineering 2012 / 10 Vol. 98

Negative hybrid sol–gel resist as hard etching mask for pattern transfer with dry etching

Grenci, Gianluca, Della Giustina, Gioia, Pozzato, Alessandro, Zanchetta, Erika, Tormen, Massimo, Brusatin, Giovanna
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Volume:
98
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2012.07.070
Date:
October, 2012
File:
PDF, 669 KB
english, 2012
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