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Plasma chemistry of an expanding Ar/C2H2 plasma used for fast deposition of a-C:H
van de Sanden, M.C.M, van Hest, M.F.A.M, de Graaf, A, Smets, A.H.M, Letourneur, K.G.Y, Boogaarts, M.G.H, Schram, D.CVolume:
8
Language:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/S0925-9635(98)00254-4
Date:
March, 1999
File:
PDF, 221 KB
english, 1999