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ALD deposited ZrO2 ultrathin layers on Si and Ge substrates: A multiple technique characterization
Botzakaki, M.A., Xanthopoulos, N., Makarona, E., Tsamis, C., Kennou, S., Ladas, S., Georga, S.N., Krontiras, C.A.Volume:
112
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2013.03.002
Date:
December, 2013
File:
PDF, 1.12 MB
english, 2013