Effects of H2 gas addition into process and H ion...

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 2013 / 7 Vol. 307

Effects of H2 gas addition into process and H ion implantation on the microstructure of hydrogenated amorphous carbon films prepared by bipolar-type plasma based ion implantation

Nakao, Setsuo, Matsumoto, Akihiro, Soga, Tetsuo, Kishi, Naoki
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Volume:
307
Language:
english
Journal:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
DOI:
10.1016/j.nimb.2012.11.082
Date:
July, 2013
File:
PDF, 836 KB
english, 2013
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