Influence of He implantation dose on strain relaxation of...

Thin Solid Films 2013 / 09 Vol. 542

Influence of He implantation dose on strain relaxation of pseudomorphic SiGe/Si heterostructure

Liu, L.J., Xue, Z.Y., Chen, D., Mu, Z.Q., Bian, J.T., Jiang, H.T., Wei, X., Di, Z.F., Zhang, M., Wang, X.
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Volume:
542
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2013.06.093
Date:
September, 2013
File:
PDF, 753 KB
english, 2013
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