Effect of total reaction pressure on electrical properties...

Effect of total reaction pressure on electrical properties of boron doped homoepitaxial (100) diamond films formed by microwave plasma-assisted chemical vapor deposition using trimethylboron

Tsubota, T, Fukui, T, Kameta, M, Saito, T, Kusakabe, K, Morooka, S, Maeda, H
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Volume:
8
Language:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/S0925-9635(99)00096-5
Date:
June, 1999
File:
PDF, 237 KB
english, 1999
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