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Diffusion of aluminum into silicon nitride films
H. Ogata, K. Kanayama, M. Ohtani, K. Fujiwara, H. Abe, H. NakayamaVolume:
48
Year:
1978
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(78)90012-3
File:
PDF, 286 KB
english, 1978