Deposition of silica films by the oxidation of silane in...

Thin Solid Films 1978 Vol. 55; Iss. 2

Deposition of silica films by the oxidation of silane in oxygen: I: The kinetics and physicochemical model of the process

L.L. Vasilyeva, V.N. Drozdov, S.M. Repinsky, K.K. Svitashev
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Volume:
55
Year:
1978
Language:
english
Pages:
8
DOI:
10.1016/0040-6090(78)90052-4
File:
PDF, 426 KB
english, 1978
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