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Investigation of interfacial reactions in thin film couples of aluminum and copper by measurement of low temperature contact resistance
J.A. Rayne, M.P. Shearer, C.L. BauerVolume:
65
Year:
1980
Language:
english
Pages:
11
DOI:
10.1016/0040-6090(80)90248-5
File:
PDF, 645 KB
english, 1980