![](/img/cover-not-exists.png)
A low temperature process for the reactive formation of Si3N4 layers on InSb
F. Olcaytug, K. Riedling, W. FallmannVolume:
67
Year:
1980
Language:
english
Pages:
4
DOI:
10.1016/0040-6090(80)90465-4
File:
PDF, 216 KB
english, 1980