Deposition of silica films by the oxidation of silane in...

Thin Solid Films 1981 Vol. 76; Iss. 1

Deposition of silica films by the oxidation of silane in oxygen II: The calculation of growth rates in the tube reactor

Ya.V. Vasiliev, L.L. Vasilieva, V.N. Droznov, A.A. Shklyaev
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Volume:
76
Year:
1981
Language:
english
Pages:
8
DOI:
10.1016/0040-6090(81)90066-3
File:
PDF, 387 KB
english, 1981
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