The possibility of thin film structural modification during...

Thin Solid Films 1981 Vol. 85; Iss. 3-4

The possibility of thin film structural modification during reactive cosputtering of Ti-Si and Ti-Al in nitrogen

G. Beensh-Marchwicka, L. Krol-Stepniewska, W. Posadowski
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Volume:
85
Year:
1981
Language:
english
DOI:
10.1016/0040-6090(81)90134-6
File:
PDF, 28 KB
english, 1981
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