![](/img/cover-not-exists.png)
Thermodynamic evaluation of chemically vapour- deposited Si3N4 films prepared by nitradation of dichlorosilane
C.E. Morosanu, E. SegalVolume:
88
Year:
1982
Language:
english
Pages:
8
DOI:
10.1016/0040-6090(82)90172-9
File:
PDF, 503 KB
english, 1982