Methods and applications of plasmatron high rate sputtering...

Thin Solid Films 1982 Vol. 92; Iss. 1-2

Methods and applications of plasmatron high rate sputtering in microelectronics, hybrid microelectronics and electronics

S. Schiller, U. Heisig, K. Goedicke, H. Bilz, K. Steinfelder
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Volume:
92
Year:
1982
Language:
english
Pages:
18
DOI:
10.1016/0040-6090(82)90190-0
File:
PDF, 971 KB
english, 1982
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