Efficiency of the SiH4 oxidation reaction in chemical...

Thin Solid Films 1983 Vol. 102; Iss. 4

Efficiency of the SiH4 oxidation reaction in chemical vapour deposition of SiO2 films at low temperature

C. Cobianu, C. Pavelescu
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Volume:
102
Year:
1983
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(83)90052-4
File:
PDF, 272 KB
english, 1983
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