Electric field dependence of the capture cross section of ion-implantation-induced traps in SiO2 layers
I. Strzal/ac̷kowski, M. Marczewski, M. KowalskiVolume:
99
Year:
1983
Language:
english
Pages:
7
DOI:
10.1016/0040-6090(83)90057-3
File:
PDF, 315 KB
english, 1983