![](/img/cover-not-exists.png)
Post-deposition high temperature processing of silicon nitride
H.J. Stein, P.S. Peercy, R.J. SokelVolume:
101
Year:
1983
Language:
english
Pages:
8
DOI:
10.1016/0040-6090(83)90096-2
File:
PDF, 425 KB
english, 1983