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Reactive etching mechanism of tungsten silicide in CF4-O2 plasma
Young H. Lee, Mao-Min Chen, Kie Y. Ahn, Arthur A. BrightVolume:
118
Year:
1984
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(84)90066-x
File:
PDF, 381 KB
english, 1984