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Insulation degradation and anomalous etching phenomena in silicon nitride films prepared by plasma-enhanced deposition
Masahiko Maeda, Hiroaki NakamuraVolume:
112
Year:
1984
Language:
english
Pages:
10
DOI:
10.1016/0040-6090(84)90218-9
File:
PDF, 658 KB
english, 1984