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Silane oxidation study: Analysis of data for SiO2 films deposited by low temperature chemical vapour deposition
C. Cobianu, C. PavelescuVolume:
117
Year:
1984
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(84)90288-8
File:
PDF, 296 KB
english, 1984