Dual-ion-beam sputtering technique for the production of hydrogenated amorphous silicon
S. Scaglione, C. Coluzza, D. Della Sala, L. Mariucci, A. Frova, G. FortunatoVolume:
120
Year:
1984
Language:
english
Pages:
8
DOI:
10.1016/0040-6090(84)90297-9
File:
PDF, 354 KB
english, 1984