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A model for the oxidation of silicon by high dose oxygen implantation
H.U. Jäger, E. Hensel, U. Kreissig, W. Skorupa, E. SobeslavskyVolume:
127
Year:
1985
Language:
english
Pages:
12
DOI:
10.1016/0040-6090(85)90221-4
File:
PDF, 614 KB
english, 1985