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Deposition of Cr-Si thin films by reactive plasmatron-magnetron sputtering
G. Sobe, H. Schreiber, G. Weise, R. Voigtmann, G. Zies, J. Sonntag, W. Brückner, R. GrötzschelVolume:
128
Year:
1985
Language:
english
Pages:
11
DOI:
10.1016/0040-6090(85)90343-8
File:
PDF, 531 KB
english, 1985