On the properties of AlN thin films grown by low...

Thin Solid Films 1986 Vol. 139; Iss. 3

On the properties of AlN thin films grown by low temperature reactive r.f. sputtering

Li Xinjiao, Xu Zechuan, He Ziyou, Cao Huazhe, Su Wuda, Chen Zhongcai, Zhou Feng, Wang Enguang
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Volume:
139
Year:
1986
Language:
english
Pages:
14
DOI:
10.1016/0040-6090(86)90056-8
File:
PDF, 700 KB
english, 1986
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