Thermal annealing behaviour of Si/SiO2 structures

Thin Solid Films 1986 Vol. 135; Iss. 1

Thermal annealing behaviour of Si/SiO2 structures

V.G. Lifshits, I.G. Kaverina, V.V. Korobtsov, A.A. Saranin, A.V. Zotov
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Volume:
135
Year:
1986
Language:
english
Pages:
7
DOI:
10.1016/0040-6090(86)90092-1
File:
PDF, 808 KB
english, 1986
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